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Scheme 1 The fabrication process of patterned ETFE film mold and the process of nanoimprinted P3HT nanograting by SART-NIL method using patterned ETFE mold.
Firstly, the fabrication of nanoimprinted P3HT nanograting can be ensured by this cost-effective and simple SART-NIL method using patterned ETFE film as mold.
In all, it indicates that OBHJ solar cell is able to be fabricated and assisted by this simple and cost-effective SART-NIL method using patterned ETFE mold.
Therefore, it indicates that OBHJ solar cell is fabricated assisted by a simple, cost-effective nanoimprinting method using patterned silk fibroin film mold at room temperature.
Therefore, it is significant to employ this cost-effective and simple SART-NIL method using patterned ETFE film as a mold to fabricate the nanostructure of conjugated polymer.
Therefore, it indicates that the nanoimprinted P3HT nanograting can be fabricated by this cost-effective and simple SART-NIL method using patterned ETFE film as mold.
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The extended methods use patterns in the contrast variance to define a minimum depth below which comparison pairs were excluded [see Additional file 2].
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