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In the active screen plasma nitiriding method, the materials to be processed are insulated and a voltage is applied to a metallic and basket-shaped mesh screen installed around the material as the cathode and the furnace wall as the anode.
1. Swab method: The materials were obtained by swabbing the dorsal surface of the tongue with 5 strokes (about 2 cm in length) of a cotton swab (Hakujuji Co Ltd. Tokyo, Japan), and then the swab was directly inoculated onto CHROMagar Candida medium (Kanto Chemical Co. Ltd., Tokyo, Japan).
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Further details are provided in the Materials and Methods section.
In this method, the material nonlinearity is also included.
In this method, the material is extracted across a horizontal plane while leaving "pillars" of untouched material to support the roof.
To overcome these problems, we developed a new feature selection method called gradient method (see the Materials and Methods).
Materials and Methods The materials and methods section should provide sufficient information to allow replication of the results.
The second section evaluated the training methods, the materials used during the laboratory sessions and the trainers.
We have explained in more detail this method in the Materials and methods section.
For further description and discussion of this method, see the 'Materials and methods' and associated Figure 1 figure supplement 1.
In "Materials and methods" section the materials and methods are explained.
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