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The MFEP technique is a novel method of plasma enhanced chemical vapor deposition (PECVD).
The authors developed the new method of plasma anodisation to ensure acceptable corrosion resistance.
The precise method of plasma generation is not material to the physical processes, as long as an electron density of ∼ 10 12 cm -3 is created.
This paper discusses a novel method of plasma deposition or etching for producing uniform or controlled non-uniform profiles on large substrates.
On the basis of positive results of research related to IPD method, the method of plasma excitation through an injection of plasma-forming gas has been applied in conditions of magnetron sputtering (gas injection magnetron sputtering, GIMS).
In this paper, a new method of plasma nitriding and plasma-enhanced chemical vapor deposition (plasma-duplex process) was conducted on Ti 6Al 4V alloy in order to modify its wear performance.
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The composite diamond-DLC film was deposited on the standard AFM silicon probe by the method of plasma-enhanced chemical vapor deposition.
In particular, precise reproduction methods of plasma shape and current profile are the key elements for any advanced control.
The objective of this study was to review the preparation methods of plasma for 2-DE, particularly those designed to improve the detection of proteins in low abundance in plasma on 2-DE.
Using the methods of plasma electrolytic oxidation (PEO) and electrophoretic deposition, the approaches to formation of composite protective coatings on magnesium alloys have been developed in order to improve their corrosion resistance and reduce the wear degree.
This paper discusses the feasibility of improving the tribological performance of AISI 304 stainless steel by applying a duplex surface treatment which combines the methods of plasma electrolytic nitrocarburising (PEN/C) and plasma-immersion ion-assisted deposition (PIAD) of a diamond-like carbon (DLC) coating.
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