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In order to obtain high deposition rate, all depositions were carried out in the metallic mode of sputtering.
Oxygen flow is maintained at a constant level while the cathode power is adjusted to fix an operation point close to the "metallic mode".
During sputtering in metallic mode, Cr2O3 stoichiometry is observed with low contents of CrN, CrO2 and (CrO2 3N, whereas in compound mode the CrO2 stoichiometry predominates.
In addition the RF power extends the range of O2 partial pressure in which the sputtering occurs in the metallic mode.
In the metallic mode, greyish TiNx films are grown whereas at higher N2 flow, TiNxOy films are synthetized with preferential O incorporation instead of N enrichment.
Anatase phase TiO2 films of high quality, in terms of both a high degree of crystallinity and a good oxygen stoichiometry, have been produced in the metallic mode of sputtering at temperature lower than 200 °C.
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The target material used was magnesium and the pulsed discharge was operated in metallic and reactive mode.
In this paper, a finite element study of 3D crack tip fields in pressure sensitive plastic solids (such as polymers or metallic glasses) under mode I, small scale yielding conditions is performed.
In this work, stationary crack tip fields in amorphous materials such as metallic glasses under mode I loading are studied to understand the factors that control crack tip plasticity and in turn impart toughness to those materials.
Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode.
These targets were then sputtered up to 60 min in metallic and poisoning modes at different flow rate of the reactive gases.
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