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A novel Multifunctional TiO2(R)/VO2(M /TiO2(A) multilayer film is designed and deposited by medium frequency reactive magnetron sputtering.
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These methods were compared with a more common method of medium frequency (MF) pulsed reactive DC magnetron sputtering.
It is demonstrated using predictions and measurements taken for a number of example silencers, that this approach enables reactive elements to work over an extended low to medium frequency range, including at frequencies above the first cut-on mode in the main duct.
Pulsed powering of a magnetron discharge in the medium frequency range (20 200 kilocycle) is the basis for a long-term stable run of reactive deposition processes at high deposition rates.
Accordingly, it is shown that a hybrid dissipative-reactive splitter design is capable of delivering improved levels of attenuation in the crucial low to medium frequency range.
medium frequency.
Buckland Park medium frequency radar.
The magnetically forced and medium frequency pulsed biased d.c.
Silicon nanocrystals embedded in a silicon oxide matrix were deposited by radio frequency reactive magnetron sputtering.
Both low and medium frequency selective channels are considered.
The above parameters affected the high frequency straight line as well as the medium frequency and low frequency arcs.
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