Surface roughness is measured on each run according to Taguchi design of experiment and finally average roughness (Ra) is measures on confirmation experiment to compare with previous given machining parameters according to the Taguchi design of experiment.
Average roughness value (Ra), measured on a surface profilometer: Talysurf PGI-120, indicated the response.
Membrane surface was achieved by measuring roughness parameters e.g. the average roughness (Ra) and root mean square roughness (Rrms), values of which were given in Table 1.
Average roughness (Ra) was measured by a probe-type surface roughness analyzer ET-4000AA, KOSAKA, Chiyoda-ku, Tokyo, Japan).
Also, to study the surface features of prepared films, the main surface roughness parameters of these films, including root mean square (RMS) and average roughness (R a ) were measured by AFM analysis.
The roughness of a 2 μm × 2 μm etched p-Si(0 0 1) surface was measured to be 0.1228 nm Ra (center line average roughness) by AFM.
The resulting average roughness parameter eventually became an accepted measure of a surface.
The counterface disks were wrought CoCr alloy with an average roughness of 1 ± 0 nm as measured by white light interferometry using a NewView 5000 Model 5032 equipped with advanced texture analysis software, MetroPro 7.7.0 (Zygo, Middlefield, CT).
mean surface roughness (Ra: center line average roughness) and material removal rate (MRR) of machined surface are measured for each experimental runs.
In order to study the effect of surface pretreatments on the modified TA2 surface, the surface roughness profiles and average roughness values were carried out using optical profilometry on the measured surfaces.
The surface arithmetic average roughness (Ra) and root mean squared roughness (RMS) have been measured by an atomic force microscope (AFM: Veeco Mutimode Nano4).
