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It was showed that root mean square roughness values (at 50 × 50 μm2 scanning scale) on both rough substrates reduced to ∼5 nm after coating with SDP-layer.
Rq = root mean square roughness.
AFM images show mirror's root mean square roughness is nearly 1 nm.
A linear relation is observed between root mean square roughness and strain.
Highly smooth surfaces were found with root mean square roughness < 1.0 nm variation.
The root mean square roughness of the films varies non-monotonically with increasing pN2.
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The root-mean square roughness of the surface is about 7 to 10 nm, and the thickness of the films is about 1 μm.
A linear relation is observed between root-mean-square roughness and both strain and grain size.
The data reveal that the E-SnO2 film shows the smallest root-mean-square roughness of 2.88 nm, a key figure-of-merit for the PSCs50.
Additionally, coalescence results in films of 3 µm thickness having a root-mean-square roughness of 8 to 10 nm.
Atomic force microscopy analysis of the etched surface reveals a root-mean-square roughness of 3.6 nm.
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