c R V hysteresis loops controlled by pulse voltage.
Measurements were conducted using industrial ac voltage, dc voltage with 50 V/s rate of rise, standard atmospheric pulse voltage (1,2/50 μs), and commutational pulse voltage (250/2500 μs).
The processing parameters, including pulse voltage, pulse frequency and pre-nitriding time were varied.
Vacuum devices generally work under high power pulse voltage of order 103 V to 106 V, and this pulse voltage could be generated by high power pulse transformer.
However, the pulse voltage used is about tenths of kilovolts.
The plasma generated by a positive pulse voltage was about two orders more intense than a negative pulse voltage.
Microporator parameters were set to pulse voltage 1300, pulse width 20 ms and number of pulses 2. Electroporated cells were cultivated in 2 ml RPMI with standard supplements.
The DNA concentration and pulse voltage were adjusted depending on the desired transfection efficiency.
Electroporation was carried out using 1350 V (pulse voltage), 20 ms (pulse width), and 2 pulses.
However, the peak pulse voltage is not affected.
