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The maximum hardness was up to 34 GPa.
The maximum hardness was found to be 48.5 and 45 GPa for NbN and NbC, respectively.
A value up to 1350 HV 0.025 constituting a maximum hardness was obtained.
The maximum hardness was observed with the films deposited at the bias voltage of − 100 V.
The achievement of the maximum hardness was related to the greatest GB solute segregation-induced strength contribution.
The maximum hardness was obtained when the grain size of Ni matrix and Ni3P particle size were comparable.
Similar(50)
Importantly, a maximum hardness is discovered at the optimum Cr addition of ∼2.0 at.%.
The hardness of the SiCN films is found to increase with increasing silicon contents, and the maximum hardness is 35 GPa.
The maximum hardness is reached for VC coatings with C/V ratios around unity, decreasing for either higher or lower C/V ratios.
From the results of the experiments, it has been shown that the maximum hardness is approximately 824 Hv when the laser power, focal position and the travel speed are 1095 W, +1 mm and 0.3 m/min, respectively.
TEM analysis revealed that the modulation wavelengths of deposited layers are less than 10 nm at various rotation speeds in FCAIP chamber and the crystal structure of TiAlN layer with the maximum hardness is NaCl-B1 structure using the Ti0.5Al0.5 target.
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