Sentence examples for maximum fabrication depth from inspiring English sources

Due to the excellent masking ability of the Si3N4 film, the maximum fabrication depth of 2.5 μm can be achieved.

With the high etching selectivity of Si(100)/SinN4 in KOH solution, the theoretical maximum fabrication depth can reach several microns.

Because of the low selectivity of Si(100)/tribo-mask, the maximum fabrication depth by the traditional friction-induced selective etching technique was only 0.54 μm.

Because of the excellent masking ability of the Si3N4 film, the maximum fabrication depth of nanostructure on silicon can reach several microns.

Based on the high etching selectivity of Si(100)/SinN4 in KOH solution, the maximum fabrication depth can reach several microns.

Due to the restriction by the above factors, the maximum fabrication depth is generally less than 700 nm, which to some extent limits the application of the fabricated nanostructures [18].

Lastly, the final fabrication depth in the central 2 × 2 μm2 area was about 3.9 nm.

Effect of normal load and KOH etching period on fabrication depth was separately clarified.

Even though the rise of etching temperature can improve the efficiency of fabrication, the fabrication depth is controlled by the contact pressure and scanning cycles.

Although the rise of etching temperature can improve fabrication efficiency, fabrication depth is dependent only upon contact pressure and scanning cycles.

To broaden the range of fabrication depth to micron scale, it is necessary to develop new fabrication methods with a high-quality mask.