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Wrinkled material layers in the form of thin polymeric coatings were prepared.
Extreme ultraviolet multilayer coatings consist of periodic or aperiodic stack of two or more material layers in the nanometric scale.
Although final device will have material layers in the tens of nanometre range, 5- and 15-μm width superlattices are fabricated using typical UV lithography.
For this reason, analysis of these materials is typically done under assumptions of linear elasticity, usually for homogeneous materials or material layers in a laminate.
Since the material layers in the laminate are elastically unidentical, stress redistribution takes place in them under the action of applied stress in order to maintain same strain in all the layers.
The advantage of having multiple material layers in one device is the potential to render multi-tasking chips, as once they are appropriately functionalized, we can provide the chip the ability of being multi-functional.
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The memory cell is mainly constituted by a thin film of chalcogenide material layer in contact with a metallic heater.
Specifically, we consider a segmented catalyst macromorphology along with confining a phase change material layer in the reactor structure, as the means for optimizing both the steady-state and transient temperature profiles in the reactor.
The optimal thicknesses of the material layers used in the microactuator are successfully determined, and the optimization process leads to a great improvement in the performance of the microactuator.
Thermal mismatch, lattice mismatch and interface misfit dislocations caused by the disparity of the material layers were investigated in detail.
Very often, multi-layer etch mask stacks composed of carbon-containing material, such as amorphous carbon or spin-on-carbon (SOC), and a few other material layers are widely applied in currently standard semiconductor nanofabrication [13, 14].
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