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Most of the other studies, however, use a simpler approach for fabrication of flexible molds for the R2R and R2P NIL processes, where a replica of a master mold is used as the flexible mold for the roller imprint process.
This is because for the application as nanoimprint mold, the hole pattern in PDMS (pillar in the master mold) is much more mechanically stable than the pillar pattern (hole in the master mold).
With this technique, molding replicas with same structures as the master mold can be obtained, in comparison to the conventional molding process in which an opposite of the master mold is obtained.
In some cases such as in [30], an imprint replica of the master mold is first obtained using nanoimprint lithography (step-and-repeat technique) onto a resist-coated wafer, where a nickel layer is then deposited onto the imprint and peeled off to be used as the flexible mold in the imprint process published in [42].
Alternatively, a flat mold may also be conducted using a soft mold, where a polymer imprint replica of the master mold is used as the mold for the imprinting process as observed in the work of Plachetka et al. [16] and Ye et al. [58].
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The master mold was fabricated on a silicon wafer with microchannels via photopolymerization.
After cooling to 70°C, the Si master mold was demolded from the patterned fluorinated polymer-coated flexible PET mold.
Microstructures on the master mold were first replicated onto a PDMS negative mold using conventional soft lithography process.
According to the procedure stated in Section "Methods", the master mold was replicated twice in order to obtain a positive working stamp.
The shape and size of the micro-sized, complex patterns of the Si master mold were replicated with high fidelity on the flat Si substrate.
As done in previous studies, this master mold was fabricated using EBL on PMMA resist combined with reactive ion etching for the pattern transfer into the silicon substrate (see Figure 1b).
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