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On the other hand, the resist mask was formed by sphere photolithography using silica spheres as the condenser lens.
The alumina mask was formed by a two-step anodization process carried out in 0.3M oxalic acid at 2°C with an injection voltage of 60 V.
The through-hole porous alumina mask was formed by dissolving the sacrificial alumina layer in 2 wt% phosphoric acid at 30 °C for 20 min.
A main silicon dioxide (SiO2) mask was formed using atomic layer deposition, and a secondary mask of a negative resist (AZ® nLOF, MicroChemicals GmbH, Ulm, Germany) was deposited upon the SiO2 layer with spin coating.
Thus, a mask was formed in which each voxel value was set to one if the voxel satisfied one of the above criteria.
The contrast of the mean EPI image was inverted to match the contrast of the T1-weighted reference anatomy: a tissue mask was formed by thresholding the mean EPI image intensity (above and below), then subtracting the intensity of each voxel from the sum of the image maximum and the image minimum.
Similar(54)
To achieve this goal, nano-scale silver (Ag) etch masks were formed using spin-coating Ag ink and subsequent sintering process.
All analyses were restricted to a group gray matter mask, which was formed by the union of each volunteer's normalized individual gray matter mask.
The Masked Brigade was formed by al-Qaida's longtime strongman in the Sahara region, Moktar Belmoktar, a one-eyed Algerian who recently declared he was leaving the terror network's Algerian branch, Al-Qaida in the Islamic Maghreb for his own group.
An etching mask of ∼2 μm was formed using photolithography with Shipley 1818 photoresist and developer 351.
An etch mask of ∼2 μm was formed using photolithography with Shipley 1818 photoresist and developer 351.
Related(20)
mask was performed
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skin was formed
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mask was added
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mask was Made
mask was flooded
mask was gone
mask was considered
mask was inspected
mask was carved
mask was strapped
mask was called
mask was closed
mask was designed
mask was set
mask was introduced
mask was made
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