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In conventional lithography, a mask is used with transparent areas and opaque areas, like a photographic negative.
In many instances, however, the mask is used only for one ceremony or occasion and then is discarded or destroyed, sometimes by burning.
At Ughoton, to the southwest of Benin, a different type of mask is used, in the cult of the water spirit Igbile.
Each mask is used by the corresponding class selector.
A convolution mask is used to binarize the acoustic features.
The reference mask is used for calibration, which negates the impact of the instrument shadow on the measurement errors.
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Several types of mask are used in conjunction with Poro.
The mask was used to produce nanowires.
A contact mask was used to pattern the PIII treatment.
Gloves, hairnet and face mask were used during sampling.
This mask was used in the GaAs etching process with RIE system Plasmalab 100 (Oxford Plasma Technology).
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