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Relief structures with very vertical side walls are prerequisite for the successful phase-shift mask effect.
After etching for 30 min, the mask effect still existed and the signal of Ga-O was very weak.
The periphery of the top surface is irregular, which should be attributed to the SiO2 hard mask effect during ICP etching.
However, mask effect will disappear when the Si surface is etched for a long time or at a high temperature as shown in Fig. 1.
Hot-embossing technique generated the PR patterns with vertical side walls which enabled phase-shift mask effect at the edge of features during the subsequent interference exposure.
Thirdly, with the mask effect of the residual Si3N4 film on the non-scratched area, the exposed Si was selectively etched in potassium hydroxide (KOH) solution (Figure 1c).
Similar(40)
An unwarranted leap to causality could mask effects that some researchers argue decrease jobs for American STEM workers.
In contrast, biotech industry studies usually allow animals to eat as much as they want which can also mask effects.
We were concerned that variation in initial aspirated length (L 0)) might mask effects of non-linear material properties.
We also tested for carry-over, i.e. mask effect-period interactions.
If age exerts a substantial influence on the ERP, then this may mask effects of interest when comparing two groups.
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