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Figure 9 The mask behavior of the structurally disturbed Si(100) surface in KOH solution.
Figure 6 The etching mask behavior of the distorted silicon layer on groove structure.
After the removal of the oxidation layer on the surface of scratched area by etching in HF solution, the silicon samples were then etched in KOH solution to detect the mask behavior of the residual disturbed silicon layer.
Therefore, since the native oxidation layer on the mesa is the same as that on the original silicon surface, the mask behavior of the mesa after etching in HF solution should be mainly attributed to the amorphous and deformed silicon induced by scratching.
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These individuals work hard to behave as "bonded and regulated," attempting to mask behaviors that come from stress, such as impatience, avoidance, rigidity and control.
This is an emotionally exhaustive undertaking of restraint through masking behavior.
This observation supports the hypothesis that their elevated activity immediately after the lights-on signal reflects a preponderance of masking behavior overlaying a minor, clock-driven component.
This elevated activity could represent endogenous clock driven activity as previously suggested [16], or positive masking behavior, or a mixture of both.
The correlation between the phase of locomotor activity under LD and DD conditions indicates entrainment; if light were simply masking behavior, a random phase would be expected when animals were placed under constant darkness.
Second, there is a delay in masking behavior to light under LD 3.5 3.5 which is similar to that seen in Clock mutants (Redlin et al., 2005).
As a result, some black male adoptees might behave in a manner similar to their urban brothers in masking behaviors to cope with this deep disjuncture.
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Justyna Jupowicz-Kozak
CEO of Professional Science Editing for Scientists @ prosciediting.com