Sentence examples for mask ability from inspiring English sources

The residual amorphous and deformed silicon layer can also exhibit strong mask ability in KOH etching.

Figure 2 Detection on the mask ability of the distorted silicon layer.

The residual amorphous and deformed silicon layer can also exhibit strong mask ability in KOH etching.  .

The mask ability of structurally disturbed silicon in KOH etching has been validated.

Besides the superficial oxidation layer, the mask ability of the tip-disturbed silicon layer needed to be further investigated.

Clearly, the scratched area on the Si(100) surface shows a strong mask ability to the etching of KOH solution.

Effective specific extinction (e*) was used to characterize their masking ability.

Due to the excellent masking ability of the Si3N4 film, the maximum fabrication depth of 2.5 μm can be achieved.

Because of the excellent masking ability of the Si3N4 film, the maximum fabrication depth of nanostructure on silicon can reach several microns.

Then, conditions allowing for complete compensation of the errors induced by faults through weight adjustment are evaluated to test the masking abilities of the network.

Experimental results prove that even single errors affect the computation in a relevant way and that weight redistribution is not able to induce complete masking after a fault occurred, i.e., the network cannot be considered per se intrinsically fault tolerant and it is not possible to rely on learning only in order to achieve complete masking abilities.