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This makes it possible to determine the rate constant directly from the experiments, even though mass transfer resistances are coexistent, by simply manipulating the inlet liquid flow rate.
A design of the control of the internal fluid temperature at the outlet of a parallel-flow heat exchanger by manipulating the inlet external fluid temperature is proposed.
A control strategy is proposed to control the internal fluid temperature at the outlet of a co-current heat exchanger by manipulating the inlet external fluid temperature.
The controllers here proposed are applied to a level control of an hydraulic system of laboratory scale, where the level of one tank is controlled by manipulating the inlet flow to the other tank.
In this study, a linear PI controller is designed using classical controller tuning methods for controlling the crystallizer outlet temperature by manipulating the inlet jacket temperature; however, the response is not satisfactory.
Then, a feedback control system, which directly uses the estimation scheme, is designed to regulate the volume-based average of the particle velocity and degree of melting by manipulating the inlet gas flow rates to the process.
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The feedback control system consists of three spatially distributed proportional integral controllers that use measurements of the etching rate at three locations across the wafer to manipulate the inlet concentration of carbon tetrafluoride in the showerhead.
The control system consists of three spatially distributed proportional integral controllers that use measurements of the deposition rate at several locations across the wafer, to manipulate the inlet concentration of silane in the showerhead and achieve a uniform deposition rate across the wafer.
The system controls pH using the imposed current density and resets the current density manipulating the hydroxide inlet concentration to the dialysate channel.
In both processes, the crystal mass production rate and the volume mean size of the product are controlled by manipulating the reactant inlet volumetric flow rates and the holdup in the crystallizer.
This is achieved by manipulating the primary air channel inlet flow rate and the secondary air channel inlet temperature.
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