Sentence examples for main etch interval from inspiring English sources

Step 2: From the selected significant wavelengths, compute the control limit in Main etch interval.

For endpoint detection in Plasma etch process, the steady state of process is defined during the main etch and after the end initial transient interval.

For the coefficient of variation, when the limits are computed based on main etch, the right endpoint is undetectable but we can notice that this chart can be used as an indicator of the endpoint approaches or also the W-CV Hotelling could be constructed based on the over etch interval by which the endpoint is detected directly and easily if the process enters in a steady state.

i is index of observations for each variable, (bar{x_{i.}}) the mean of this statistic CV in main etch.

For each variable, i is index of observations, (bar{x_{i.}}) the mean of mean this statistic in main etch.

(T^2) is equal to a scalar value for each time sample showing the distance away the main etch.

i is the number of observations in each variable; (bar{x_{i.}}) the mean of SD this statistic in main etch.

For the first observation, (X_1) is 0 (starting value) and (Z_0) is mean of mean of (X_i) in steady state (Main etch).

i is the number of observations in each variable, (bar{x_{i.}}) the mean of mean this statistic in main etch.

For the first observation, (X_1) is 0 (starting value) and (Z_0) is mean of SD of (X_i) in steady state (Main etch).

For the first observation, (X_1) is 0 (starting value) and (Z_0) is the mean of CV of (X_i) in steady state (Main etch).