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The distribution of lithium in V2O5/V lower oxide duplex thin films prepared by thermal oxidation of V metal was analysed by XPS and ToF-SIMS after intercalation at 2.8 V versus Li/Li+ and de-intercalation at 3.8 V following cycling between 3.8 and 2.8 V in 1 M LiClO4-PC.
The higher scan speed (8.376 μm/s) leads to a lower oxide height (0.79 nm), as shown in Figure 6d.
However, this lower oxide is apparently an inhibitor of S2O2−8 reduction.
This is due to lower oxide charges for the thicker GdO x membrane (55 vs. 43 nm [36]) and polycrystalline grains with higher OH− ions (Fig. 3f).
It has lower oxide content due to less in-flight exposure time and smoother as-sprayed surface because of smaller powder sizes and higher impact velocities [87].
Hf/Zr co-doping led to lower oxide scale growth rate than Hf or Zr single-doping.
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The results obtained showed that the amount of lower oxides and the oxidation state of chromium depend both on the graphite flake size and the intercalation time.
It was shown that the oxidation of the lower oxides of chromium occurs in a potential range of oxygen evolution and, therefore, no anodic peak is perceptible.
The characteristic anodic peak at 1.3 1.4 V vs nhe obtained for GIC-CrO3's in 0.25 M H2SO4 was evidenced to be associated with the oxidation of the lower oxides of Cr such as Cr3O8 and/or Cr2O5 remaining in the compounds after their treatment in hot 6 M HCl.
The concentration of intercalant in GIC-CrO3's decreases on prolonging the intercalation process as a result of the increase of the amount of lower oxides and the decrease of the oxidation state of chromium.
However, hydroxides and lower oxides are also present, especially in rapidly grown films.
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