Sentence examples for limiting deposition from inspiring English sources

Exact(1)

It was clearly shown that particle circulation times increased with decreasing modulus, enabling passage through (and therefore limiting deposition in) the lungs and kidneys for particles with the lowest modulus.

Similar(59)

From the perspective of a potential respondent, the most significant of the proposed changes would facilitate limited deposition discovery and adjust time limits to accommodate the discovery depositions as well as assimilate what is often a voluminous investigative record.

Copper sulfide (CuS) thin films were grown on a single crystal Ag(1 1 1) substrate by Electrochemical Atomic Layer Deposition (ECALD) method, i.e., by alternated surface limited deposition of copper and sulfur.

In addition, ectopic H3K9me2 is detected on synapsed chromosomes in the absence of CSR-1, leading us to propose that CSR-1 activity might limit deposition of H3K9me2 marks at synapsed regions (She et al. 2009).

An experimental kiln limiting this deposition phenomenon has been designed, built and tested.

Channelization is facilitated by shade from the tree canopy, which limits the growth of underwater vegetation thereby minimizing the resistance to flow and limiting sediment deposition.

Consequently, bubbling can be expected to be only partially efficient, as bubbles are efficient for limiting particle deposition and polarisation phenomena, but not for internal fouling.

It is hypothesized that as fat stores increase, so does insulin resistance, limiting further deposition in the subcutaneous stores.

This suggests that it is not the methylase but another activity which is limiting the deposition of H3K27me3.

To gain insights about the significance of iron in MS pathogenesis, results from pharmacological studies directed at controlling the toxic effects of iron, e.g., iron-catalyzed oxidative damage, or studies limiting iron deposition or promoting its removal can be examined.

ALD is a cyclic self-limiting deposition method, which is capable of conformal and uniform coating of thin films at the atomic level.

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