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The layer is cured by exposure to ultraviolet light.
After a heat treatment at 150°C for 1 h, the PDMS layer is cured at the bottom of the ZnO nanowire array forming a matrix.
Once a layer is cured, the blade is retracted to the desired thickness for the next layer and a different mixture is applied.
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After dip-coating the PDMS layer was cured at 70 °C for 1 h.
After degassing, the quartz master mold with a uniform layer was cured at 120°C for 15 min.
The insulating layer was cured at 100°C for 1 h.
The PDMS layer was cured for 48 h at 40 °C (T < As).
For most samples, a glass counter substrate was then added and the epoxy layer was cured by exposure to a UV lamp for 1 3 h.
The layers were cured using a tunnel drier at 70 °C (Natgraph, Nottingham, UK).
Imprint resist spun onto a substrate is brought into physical contact with a master, and the resist is cured leaving the imprinted nanochannel structures in the resist layer.
A 1.5 mm-thick layer of soft silicone was cured in a mold.
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CEO of Professional Science Editing for Scientists @ prosciediting.com