This is partly due to difficulty in preparation of single crystalline TMD films with large uniformity.
The huge number of active sites (CNTs) for both heating and bubble nucleation and the possibility to fine-tune the heating energy provide large uniformity and an extra control over the bubble growth, to generate well-expanded, fine-celled, uniform, relatively thick foams.
In addition, it is found that a larger uniformity factor always leads to a higher effectiveness of heat exchangers.
They can also result in significant surface roughness which hinders large area uniformity.
Yet, sputtering is the most commonly used technique due to their thickness controllability, large area uniformity, low temperature, and less-toxic process.
Atomic layer deposition (ALD) has emerged as an important technique for a variety of applications based on large area uniformity, precise thickness control, and highly conformal deposition.
Atomic layer deposition (ALD) has distinguished advantages over others for its precise thickness control, extremely conformal surface coating for nanostructures, large area uniformity, and low growth temperature [19-21] [19-21]
Compared to CVD, PECVD, and chemical solution method, it exhibits unique advantages, including large area uniformity, excellent three-dimensional conformality, precise and simple control of film-thickness, flexible surface modification, and low processing temperature [38].
Although sensors based on CNT networks/composites are relatively cheap, especially those that are solution-processed, and mechanically compatible when worn on the human body, several issues such as a slow response time, a large area uniformity, and the hysteresis and drift of signals still need to be solved.
Atomic layer deposition (ALD) is a new type of thin film deposition technology based on sequential self-limited and complementary surface chemisorptions reactions using precursor vapor with simple and precision thickness control, large area uniformity, and excellent three-dimensional conformality, especially for deposition of nano-laminated structure [18, 19].
The morphology and microstructure of the hierarchical SnO2 architecture showed that flower-like hierarchical SnO2 architecture with six similar petals were organized by large scale uniformity and ordered dense nanorods arrays with a diameter of 10 15 nm and length of about 200 nm.
