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VMGFET is fabricated using standard IC fabrication processes such as UV lithography and silicon dry etching process.
The IMX046 is fabricated using a 90 nm CMOS process.
The THH-VCSOA is fabricated using a four-contact configuration.
The prototype is fabricated using a 45-nanometer process and consists of a total of eight cores.
Secondly, a temperature sensor is fabricated using a specific FBG.
Specifically, SW-PCF is fabricated using sol gel casting technique.
Such a structure is fabricated using standard CMOS process.
This flow meter is fabricated using the proposed PCB substrate.
The designed sensor is fabricated using the standard microstrip technology.
A prototypes is fabricated using a cost effective microfabrication process as a proof of concept.
To explore this potential, the COHN is fabricated using vertical GaN nanowires.
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