Third, this study only investigated temperature.
In all cases, however, investigated temperature ranges were quite limited (1,000 to 1,700 K).
Layers with thicknesses below 5 nm exhibit semiconductive-like properties in the whole investigated temperature range.
The data are in-line with values reported in literature and extend the investigated temperature range.
Five relevant factors were investigated: temperature, air pressure, catalyst loading, air flow rate and reaction time.
It shows that Kevlar outperforms Zylon in the investigated temperature range.
The observed Raman shifts are relatively small confirming high stability of the Na2WO4 films within the investigated temperature range.
The following process variables were investigated: temperature, partial pressure of hydrogen, catalyst concentration, agitation speed, and their interactions.
The following variables were investigated: temperature, heating rate, inert gas (N2) flow rate, and CaO/SR ratio.
Moreover, the oscillations of specular beam of diffraction pattern were not observed during the growth in all the investigated temperature ranges, i.e., 150-450°С.
In situ high-temperature X-ray synchrotron powder diffraction revealed that HoCo0.5Cr0.5O3 remains orthorhombic up to highest investigated temperature of 1140 K.
