Sentence examples for intermediate deposition from inspiring English sources
The phrase "intermediate deposition" is correct and usable in written English.
It can be used in contexts related to geology, materials science, or any field discussing processes involving layers or stages of deposition. Example: "The study focused on the intermediate deposition of sediment layers in the river delta."
Sintered/plasma nitrided+Ti samples, however, presented the best electrochemical stability for an intermediate deposition time of 30 min, while films deposited during 60 min were found to be more easily corroded, probably due to a decrease in the film-to-substrate adhesion because of the presence of a nitride layer prior to coating.
However, at intermediate deposition distances, uniform and refined primary Si phases, 3 8 μm size, are observed.
The microcavity-deposition method can be combined with macrocavity-deposition method to extract the important reaction pathways like as the intermediate deposition.
Silicon carbide (SiC) coating is deposited on C/C composite substrate for the first time by chemical vapor deposition (CVD) with hexamethyldisilylamine (HMDS, C6H19NSi2) as precursor and N2 as carrier gas in an intermediate deposition temperature range.
To allow growth of ZnO, the insulating Al2O3 layer had to be removed by etching in HCl and the surface kept reactive by an intermediate deposition of zinc from a zincate bath.
Contact angle, sum frequency generation (SFG) spectroscopy, X-ray photoelectron spectroscopy (XPS), and ellipsometry results are consistent with the formation of disordered sub-monolayer structures at short deposition times, well-ordered monolayers at intermediate deposition times, and inhomogeneous multilayers at long deposition times.
Diamond thin films were successfully deposited on both sides of jetted substrates Ti6Al4V alloy, without intermediate layers deposition, by using an enhanced 2.45 GHz microwave-assisted technique.
Maximum growth with intermediate lipid deposition levels was obtained with dietary lipid levels between 10 and 15% (Gaylord and Gatlin 2000).
The adhesion was strongly dependent on the thickness of W layer and the CH4 fraction in the sputtering gas during the intermediate layer deposition.
It was found that both the lead inhibits the formation of strongly bound intermediates and the intermediates inhibit the deposition of lead.
In case of multilayer with lower thickness nanocrystalline layers, the band gap shifts toward higher values (1.64 eV to 1.72 eV) on increasing hydrogen dilution from 2 to 4. This can be justified on the basis that intermediate nanocrystalline layer deposition time is only 1 min (Table 1).
