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interface roughness.
In this case, hole mobility suffers from interface roughness.
This trend confirms that the interface roughness becomes worse.
Interface roughness is randomly generated using an exponential autocorrelation function.
In addition, the interface roughness was significantly increased which led to further channel mobility degradation.
The method is convenient to include wave scattering on interface roughness.
The slope of the fitting line is related to the interface roughness δ.
Interface roughness has often been discussed as a factor in determining current through RTDs.
The slope of the fitting line is related to the QW/QB interface roughness.
With further raising in the percentage to 50% (S5), the interface roughness is increased dramatically.
Alloy and interface roughness scattering mechanisms are dominant at low temperatures.
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