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ICP was used to increase plasma density with ICP power change.
Such outflowing ionospheric ions increase plasma density.
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Many papers report a positive effect of higher ionization and increased plasma density.
Specifically, increased plasma density and electron temperatures, and therefore increased ion energy fluxes to the growing film, have been measured.
The substantial drop of the plasma temperature along magnetic field lines with increasing plasma density is one of the main features in tokamak divertors.
Thus, the increased plasma density may be the cause of the decreased occurrence of FLR type pulsations in the winter months of solar activity maximum years (winter anomaly).
Increasing plasma density collisions leads to the decrease in temperature of plasma electrons.
In accordance with Fig. 2, the growth rate is constant by increasing plasma density.
The application of weak axial electromagnetic field to a planar inductively coupled plasma showed increased plasma densities, therefore, increased polysilicon etch rates compared with those by conventional inductively coupled plasmas.
We are planning to increase the microwave power to increase the plasma density up to 1017 m−3, making it possible to investigate charge separation at higher density condition.
When the discharge frequency (∼100 MHz) of the RF power source is increased, the plasma density increases while the electron temperature decreases.
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