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For a more detailed evaluation of the DDIs than the AUC increase in substrates, the time profiles of the substrate concentration in the presence and absence of inhibitor can be simulated by using a PBPK model which describes the disposition of both substrate and inhibitor (Kanamitsu et al. 2000; Rowland et al. 2010).
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It was found that an increase in substrate temperature and CH4/ZrCl4 ratio resulted in increased growth rate of ZrC coatings.
The optical transmittance was also increased along with the increase in substrate temperature.
The Ki values were increased with an increase in substrate concentrations.
The grain size and the crystallization extent increase with the increase in substrate temperature.
Initially, there is an obvious decrease followed by an increase in grain size with the increase in substrate temperature.
An increase in substrate temperature results in a monotonic decrease of compressive internal macrostress from 3.2 to 2.0 GPa.
Intrinsic hardness of the films decreases generally with an increase in substrate temperature and in molecular weight of carbides.
With an increase in substrate temperature, the film orients strongly towards the (100) plane of the Cu3N phase.
As shown in Figure 2(C) and Table 2, the DHA/PA and DHA/DPA ratios and DHA percentage decreased concomitantly with an increase in substrate concentration.
The XRD analyses indicate that ZnS films have zinc blende structures with (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures.
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