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Nanostructures could provide intriguing possibilities for resolving those challenges and improving device performance.
The triple δ-doped sheets densities are found to be crucial for improving device performance.
Molybdenum oxide (MoO3) has gained significant attention for improving device performance and stability in OSCs [81, 82, 83, 84].
Therefore, the ordered heterojunction morphology plays an important part in improving device performance due to efficient exciton diffusion, dissociation, and reducing charge recombination rate.
Furthermore, the ordered heterojunction morphology played an important part in improving device performance due to optical absorption enhancement, interfacial area increase, and bicontinuous pathway.
There has been increasing concern in recent years that the limits of what can be achieved with current approaches to improving device performance will soon be reached.
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The Si(Ge) alloy is currently used in the Complementary Metal Oxide Semiconductor (CMOS) technology, improving device performances, decreasing power consumption, and allowing stress engineering in Si-based devices.
This indicates that the formation of the triple heterojunction is the more ideal scheme for improving device performances in organic inorganic hybrid architectures.
Both the nanohole- and nanopillar-type patterned metallic electrodes (PMEs) have been introduced in organic solar cells (OSCs) for improving device performances experimentally, but there is few work addressing the similarities and differences between them.
Therefore, to improve device performance, various studies have been performed on modified TiO2-NRA surfaces.
In addition, proposed HG TFETs showed improved device performance than previous HG TFETs by improvement in device design.
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