Sentence examples for improved deposits from inspiring English sources

The results indicate, that improved deposits are obtained capable to withstand very demanding applications where high microhardness along with resistance to corrosion is a prerequisite.

In additive-free solutions, the use of pulsed current (PC) improved deposit morphology and brightness over DC plating.

The presence of thiourea generally improved deposit quality over that obtained in additive-free solutions, but caused the formation of microscopic nodules and the deposits to appear slightly cloudy, resulting in lower reflectances than that of a polished uncoated copper surface.

Citrates are frequently used as additives in the electrodeposition of metals such as manganese in order to improve deposit characteristics and process efficiency.

The surface hydrophilicity of PET grafts was significantly improved after depositing Cu-BG nanocoatings.

Furthermore, the quality of the VO2 thin film was significantly improved by depositing it on the Al2O3 buffer layer.

The surface physicochemical properties including hydrophilicity and hardness of ESM were significantly improved after depositing Cu-BG nanocoatings.

When device transparency is non-critical, the turn-on resistance can be improved by depositing a thicker Ti interlayer before growth.

The sensitivity of the capacitive sensor in use is improved by depositing an insulating self-assembled monolayer (SAM) over the golden electrodes.

Film growth rate and capacitance of HfO2 dielectric layers was improved by depositing stacked structures with polycrystalline films of higher purity at 600 °C on thin HfO2 sublayer grown on Si at 300 °C.

The resistivity ratio of the thin films before (T = 25 °C) and after (T = 25 °C) phase transition were significantly improved when deposited on the Al2O3 buffer layers over a naked silicon substrate, owing to the high resistivity of the thin films at room temperature (25 °C).