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The successful combination of nanoimprint with optical lithography relies on the fact that the imprint process does not change the properties of the imprinted material, in this case the optical ones, so that these can be exploited in a further processing step, namely lithography.
Allyl prepolymers cure during the imprint process as a result of heating.
Such procedure is promising for an easy access to material data for imprint process optimisation.
We designed an imprint process using a micro/nano-structured mold to emboss several polymer coatings in order to introduce superhydrophobicity and still maintain their transparent/translucent properties.
Such data can be adopted to optimise an imprint process for mixed pattern sizes ranging from the micron down to the nanometre scale.
This paper reports on the flattening of a rough surface of an electroplated Au pattern on a Si wafer by the thermal imprint process and its application to surface-activated room-temperature bonding.
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In order to better understand the forming mechanism at vertical imprint and roller imprint processes, a special case for vertical imprint was used.
The normal stress distribution and slip vector at an imprint depth of 4 nm for the two imprint processes are shown in Figs. 8 and 9, respectively.
The simulations were conducted on gold using the same mold in both nanoimprint and roller imprint processes for convenience and to simplify the comparisons.
Side views of patterned structures of (b) Al 010) and (c) Al(111). Figure 6b,c presents the side views of patterned structures after the direct imprint processes of Al 010) and Al(111), respectively.
Figure 6a plots variations of the imprint force with moving distance during the direct imprint processes of the two aluminum substrates with different orientations, which demonstrates that the two curves show similar characteristics as described in 'On the nature of direct imprint mechanisms' section.
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