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For ICP operation, an RF generator power of 1300 W was used.
In contrast, only ohmic response was measured without Nafion pattern so that one can judge the proper ICP operation (Fig. 2b).
This was because the repulsions of molecules were weak due to the absence of strong electrokinetic flow which was usually involved in conventional ICP operation.
We suggest that further issues need to be resolved to better understand the main heating process in low-pressure ICP operation.
The position of location where the fluorescent intensity was maximum of each target gene and the amplification ratio were plotted as a function of time during the ICP operation.
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Time-resolved measurements were accomplished for Ar plasma to have better perspective of the E-ICP operation.
The adoption of E-ICP operation for SiO2 etch with CF4 gas also provides better etch profile and higher etch rate than cw-ICP process.
The etch rate of E-ICP operation in the vertical direction is approximately 1.5 times larger than that of a cw-ICP, while side etch rate does not vary noticeably, to provide more vertical etch profile than normal.
ICP process is presented.
The ICP-MS operation and data acquisition (by peak hopping) was accomplished by using Qtegra software, using a dwell time of 10 ms and 20 sweeps per reading, and 4 replicates per sample.
ICP runs the Psychopathic Records operation from a two-story brick building in Farmington Hills, a suburb outside Detroit.
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