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However, CNFs synthesized at 700°C had the highest oxidation temperature (c.a. 690°C).
CNFs at 700°C displayed the highest oxidation temperature, but CNFs at 500°C displayed a bimodal oxidation profile.
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While HR-TEM characterization carried out on samples with three different oxidation conditions reveals that WOx is always in the crystalline phase in our oxidation temperature range, higher oxidation temperature leads to denser and thicker oxides.
In general, longer oxidation times and a higher oxidation temperature result in the formation of more protective oxide layers.
Too higher oxidation temperature is not good for the transmittance.
The figure also reveals the formation of carbon nano-fiber beside CNTs as confirmed by high oxidation temperature in thermal analysis data.
In our work, high quality circular SiNWs with diameter of 5 nm have been successfully fabricated at high oxidation temperature of 950 °C.
The results show that both long oxidation time and high oxidation temperature can obtain the film with a good transmittance (over 80%% for visible and infrared light) and a high carrier concentration.
Higher oxidation temperature favors the formation of circular SiNWs, since the impact of oxidation retardation on the oxidation rate at sharp corners is reduced, and the discrepancy between the oxidation rates of different SiNW planes is minimized.
The shortcoming encountered by the former gate is the slow growth gate, high oxidation temperature (>700°C), and high leakage current [12, 13] while the latter gate with a relatively low k is unable to withstand the high electric field imposed on GaN [7, 20, 21].
And 42.26 % of deposit carbon was carbon in the high graphitic form (higher than 600 °C), the higher oxidation temperature of this peak (700 °C) is due to the formation of carbon nano-fibers beside the CNTs [35], which is in a good agreement with the TEM data.
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