Sentence examples for highest etch from inspiring English sources

When the gas mixing ratio was BCl3 (14 sccm)/N2 (6 sccm), with the other conditions fixed, the highest etch rate was obtained.

The polymers containing the photochemically most active group (triazene) are also the polymers with the lowest threshold of ablation and the highest etch rates, followed by the designed polyesters and then PI.

The polymers containing the photochemically most active group (triazene) are also the polymers with the lowest threshold of ablation and the highest etch rates, followed by a designed polyester and then polyimide.

The polymers containing the photochemically most active group (triazene) exhibit the lowest threshold of ablation (as low as 25 mJ cm−2) and the highest etch rates (up to 3 μm/pulse), followed by the designed polyesters and then polyimide.

In principle, the undercutting takes place due to the exposure of low coordination atoms with high removal rates, but the facets at the undercut corners are not the highest etch-rate planes.

In general, they explain that the undercutting occur due to the appearance of high etch rate planes during etching process [80-85] [80-85]

The assembly of PS-b-PSSi was well-controlled by solvent annealing on the SU-8 and deep nanopores were formed in the underlying layer by oxygen reactive ion etching due to high etch contrast.

In the high etch rate and high selectivity reactive ion etching process, it was found that the bottom and sidewall surfaces were rough in the Cr mask etching because of physical sputtering of the Cr film by ion bombardment.

The 1st etching step is designed to provide high etch rate and throughput while the 2nd etch step is designed to control the taper angle of the via.

Therefore, it is necessary to study on how obtain a high etch rate and a good etch profile for dry etching mechanism of BaTiO3 thin film.

The major objective of this work is to investigate the effect of NH2OH to achieve high etch rate and undercutting to promote the application of wet anisotropic etching in MEMS fabrication.