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Higher metal coverage gives a higher etching rate.
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Using density functional theory and molecular dynamics to explore the adsorption of CO2 and CH4 at atmospheric pressure and 300 K we found that both adsorb on a graphene layer modified with titanium at high metal coverage (C2Ti).
Density functional theory and molecular dynamics were used to study the adsorption of a water molecule on a graphene layer modified with titanium at high metal coverage, with the Ti atoms located above the centers of the carbon hexagons.
In this paper we present a comprehensive study of the impact of asymmetric metal coverage on matched high performance MOSFET pairs.
In this study we report the first results on the impact of metal coverage on the matching of high and low ohmic polysilicon resistors in a 0.35 μm analogue CMOS technology.
Figure 3 Etching rate of metal particle-deposited Si wafers as a function of metal coverage.
To compare the catalytic activity of the metals for the metal-assisted HF etching of Si, we controlled its metal coverage by changing the metal deposition conditions.
A significant degradation in matching is observed, especially when matched resistors have unequal metal coverage.
The properties of the Ag-coated CSSNs are dependent on metal coverage.
Flow diverters constitute a new generation of flexible self-expanding stent-like devices with a high metal-surface area coverage, specifically designed for the endovascular management of complex cerebral aneurysms.
The building is surrounded by high metal fences and CCTV.
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