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These technologies can produce a high resolution pattern, but they are inconvenient to form 3D structures and expensive to change patterns [10].
Ko et al. demonstrated that the low-temperature metal deposition as well as high resolution pattern can be achieved via the laser sintering of inkjet-printed metal nanoparticles, which overcomes the resolution limitation of the current inkjet direct writing processes [2].
The work is concentrated on Heraeus pastes that make it possible to reach up to about 300 μm film thickness and, if needed, high resolution pattern of lower film thickness on the same substrate, metallised through holes and application of ENIG metallisation.
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The ion source uses pure liquid gold and the ion optics is designed for high resolution patterning.
The formation of Taylor cone jet is a key process in electrohydrodynamic printing that is used to produce high resolution patterns.
Further, the applicability of in silico analysis in performing a high resolution patterning of genetic divergence and population structure was demonstrated.
Inkjet-printed high resolution patterns were obtained by printing the prepared ink formulation on silicon wafers utilizing evaporation-driven self-assembly processes.
The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography.
In this work we present a UV-Nanoimprint (NIL) process flow based on the combination of a novel fully organic imprint resist and a hybrid stamp for high resolution patterning and low-defect imprinting in the sub-100 nm regime.
Thin resist is generally used for high resolution patterning in to reduce the effect of capillary force during resist drying, which leads to pattern collapse (unless using critical point drying [12]), and the forward scattering of electrons that is more serious for thicker resist [13].
Fabrication of metamaterials for optical applications has mostly employed top-down lithography using extremely high resolution patterning techniques such as e-beam lithography, 346 focused ion beam milling, 347 nano-imprint lithography, 348 and laser DW. 349 For the rapid expansion of metamaterials research, low cost nano-scale fabrication is necessary.
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