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Vacuum devices generally work under high power pulse voltage of order 103 V to 106 V, and this pulse voltage could be generated by high power pulse transformer.
This paper is a brief summary of high power pulse transformer design.
High power pulse magnetron sputtering processes enable protective hard layer deposition at a high rate.
The high power pulse magnetron sputtering (HPPMS) technology offers several advantages with regard to the deposition of hard coatings.
The coatings were synthesized using a hybrid technology, consisting of direct current and high power pulse magnetron sputtering dcMS/HPPMS.
In this paper, the principle, types and characteristics specification of high power pulse transformer are presented, and the design methods of electrical, magnetic and structure parameters are summarized.
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Recent developments in the area of pulsed laser heating of samples use short, high power pulses at infrared wavelengths; samples can be heated to several thousand degrees K.
This form of high power pulses has been named deep oscillation magnetron sputtering (DOMS).
The peak substrate current density during high power pulses was measured up to 50 mA·cm− 2.
DOMS is an alternative high power impulse magnetron sputtering technique that uses large voltage oscillation packets to achieve high power pulses for sputtering.
High power impulse magnetron sputtering (HiPIMS) is a recent sputtering technique that utilizes IPVD where a high density plasma is created by applying high power pulses at low frequency and low duty cycle to a magnetron sputtering device.
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