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High power impulse magnetron sputtering.
High power impulse magnetron sputtering (HIPIMS) pulses have been of great interest over the last decade.
SiNx and SiCxNy coatings were fabricated with high power impulse magnetron sputtering (HiPIMS).
Molybdenum nitride films have been prepared by high power impulse magnetron sputtering (HiPIMS).
High power impulse magnetron sputtering (HiPIMS) is a novel physical vapor deposition (PVD) technique.
Using high power impulse magnetron sputtering (HiPIMS) technique, amorphous FeCuNbSiB thin films have been deposited.
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The dual-high power impulse magnetron sputtering superimposed with mid-frequency discharge was employed for ionized vapor deposition of Ti Cu films.
The paper deals with thermochromic VO2 prepared by reactive high-power impulse magnetron sputtering and characterized by spectroscopic ellipsometry.
High-power impulse magnetron sputtering (HIPIMS) technologies have great potential for material processing and surface modification of substrates.
Unipolar superimposed high-power impulse magnetron sputtering (HiPIMS) was successfully used to deposit nc-WC/a-C H thinc-WC/a-C H
Films were deposited using high-power impulse magnetron sputtering (HiPIMS) assisted by an electron cyclotron wave resonance (ECWR) plasma.
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