Sentence examples for growing uniform from inspiring English sources

This helps in growing uniform BLG with less defect density.

ALD has manifested itself as a technique suitable for the semiconductor industry due to its capability of growing uniform and conformal thin films [14].

Special emphasis has been put on one-step CVD as it shows greater potential for growing uniform large-grain thin films of single-layer MoS2.

In this paper, we report a facile one-pot electrodeposition and anodic aluminum oxide [AAO] template-assisted method for growing uniform and well-aligned 1D Bi-Ni heterojunctions at a low temperature.

In recent years, epitaxial growth has been found to be a powerful strategy in growing uniform SWCNTs using low-dimensional nanocarbons, organic macromolecules and metal nanoparticles as growth seeds or templates to control their nucleation.

The N-UNCD layer has a high density of electrochemically active sites for nucleation at the exposed edge of the pattern, ensuring favorable conditions for growing uniform, dense, continuous nanowires.

To grow uniform films on a large substrate by magnetron sputtering with a small target, a new theoretical model has been proposed, implemented and confirmed.

Liquid metal, such as Ga, has been demonstrated to be a good catalyst to grow uniform graphene at about 1000 °C.

However, all regular nano-oxide thin film deposition methods, such as plasma-enhanced chemical vapor deposition (PECVD), molecular beam epitaxy (MBE), magnetic sputtering, electron beam evaporation, and pulsed laser deposition (PLD) [8-13], cannot grow uniform nano-oxide thin films in a high aspect ratio structure.

It was founded that the morphology of (CH3NH3 3Bi2I9 was changed by the selection of electron transporting layers (ETL), and that the small amount addition of NMP (N-methyl-2-pyrrolidone) solvent could also attain to grow uniform surface morphology [18, 19].

Unfortunately, it is challenging to synthesize or grow uniform single-crystalline film over a large area, and noble metal film is commonly deposited by evaporation or sputtering that, even with an adhesion/seed layer of Ti or Cr, both give a rough or even incontinuous island film.