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b Cr gratings with patterned PMMA as photoresist.
We compared gratings with double crosses regarding the achievable accuracy.
Also gratings with spatial frequency ~1500 mm−1 were recorded (Fig. 9).
b SEM image of Si3N4 gratings with periodic at 400 nm and fill factor 0.5.
Hence, a variety of HfO2 gratings with different grating parameters are fabricated for optical characterization.
Epitaxial gratings with smooth facets are observed in Figure 3c,d.
Figure 3 PL spectra of epitaxial gratings with various air openings.
We will present three kinds of gratings, echelon grating, crossed gratings and gratings with circular apertures.
The procedure is stable for writing weak fiber Bragg gratings with pre-designed index profiles.
permits to generate gratings with 6.6, 20 and 30 μm wide periods.
This constant resolution is maintained even for gratings with different line densities.
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