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Thermally assisted (ion generated) defect migration across the Co/Si interface enhanced defect mediated atomic mobility, which led to the formation of cobalt silicides, in accordance with the thermodynamically favored route.
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Crack initiation is controlled using generated defects within fibers.
This can be explained by the stress-induced leakage current via generated defects in the oxide thin films [7].
This was mainly explained by the reduced potential fluctuation and the generated defects in the QW by strain relaxation, respectively.
The geometric parameters of the generated defects result in target statistics equivalent to that of the defects in the micrographs.
When the insulator or semiconductor is subjected to radiation, electron hole pairs are generated, defects in the OSL material trap these electron hole pairs.
The Si used in the growth process of nanowires is obtained from thermally generated defects on the surface of Si (100).
Despite the density of the generated defects, a constant output current was observed up to the highest investigated dose of 59.9 Mrad.
It is valuable for understanding the physics of defects evolution through artificially generated defects, and such defect engineering will greatly open up the future application of the novel material.
However, as the stress proceeds, a larger amount of charge is trapped in the as-grown or generated defects on the leaky positions, leading to a higher reduction of the current compared to amorphous oxides.
Since these leaky regions could be related to the grain boundaries between nanocrystals, charge trapping (in as-grown or generated defects) mainly occurs at those locations, leading to a higher reduction of the conductivity compared to the background areas.
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