The organic species were further removed by thermal treatment leading to a fuzzy assembly of hexaniobate nanoscrolls.
Moreover, NO3−-N and NO2−-N generated in the process of NH4+-N oxidation could be further removed by biocathode.
NH4Cl was further removed by the stages of rinsing and thermal treatment at 550 °C for 6 h.
Therefore, in the second part, the redundancy of each feature type is further removed by selecting a subset.
Cell pellets were weighed and separated whereas supernatants were used to estimate the amount of Cd2+ in the wastewater and further removed by bacterial isolate.
Some residual PMMA was further removed by annealing in a H2 (500 sccm) and Ar (500 sccm) environment at a temperature of 450°C for 2 h.
This resulted in a hollow SiO2 structure that was buried inside the silicon, which was further removed by wet-etching it in KOH (Figures 3a-5).
The residual oxygen-containing groups and other structural defects such as sp3-hybridized carbons in the electrodeposited graphene were further removed by photo-assisted reduction of the underlying TiO2 NTs, thus achieving the maximum restoration of π-conjugation in the graphene planes.
