The EKF requires analytical computation of the partial derivatives and approximates the measurement function in a point.
This case corresponds to even mirror boundary conditions (EMBC), when Ψ function in real point and its images are the same.
The one shown in (b) displays the value of the center of the fitted Gaussian for those ones located between 1.5 and 2.1 eV, while (c) represents the amplitude of that function in every point.
When a patch of the interpolating surface does not satisfy the need of design, say it is too high or too low at a point and its neighbourhood, the values of the interpolating function in these points need to be decreased or increased under the condition that the interpolating data are not changed.
If one employs the sigmoid function in the point-neuron model, then the analysis, as we will see below, becomes much more involved.
Recently, Petruşel et al. [14] have shown the role of equivalent metrics and metric-preserving functions in fixed point theory.
Thus, two types of boundary conditions - even and odd ones - can be applied, when Ψ functions in a point, and its image, are equated with the same and the opposite signs, correspondingly.
For the case of odd mirror boundary conditions (OMBC), Ψ functions in real point and its images should have the opposite sign, which means that the incident and reflected de Broglie waves cancel each other at the boundary.
The basic assumption is that a particle (an electron or a hole) is specularly reflected by a QD boundary, which sets the boundary conditions as equivalence of particle's Ψ-function in an arbitrary point r inside the semiconductor (Ψr) with wave function in the image point im (Ψim).
The boundary conditions are stated as magnitude equivalence of electron's Ψ function in an arbitrary point inside a three-dimensional quantum well and image point formed by mirror reflection in the walls defining the nanostructure.
