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Both modes enable the formation of Ni rods, however, reproducibility of mold free deposition mode was not good.
Two different deposition modes were examined to form metal rods, one is a mold free deposition mode and the other is a mold assisted deposition mode.
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Additive-free deposition results in relatively large columnar grains with numerous growth twins of nanoscale dimensions.
HiPIMS utilization made reliable arc-free deposition of coatings with high carbon content possible.
The melting point of this alloy is above 62 °C, which makes it suitable for a vacuum-free deposition process and easy and fast device test.
It was found that the crack-free deposition can be achieved owing to the fact that micro-LAAM process used in this study had very low heat input.
HiPIMS is a low-temperature process, giving well-adherent coatings, better quality films, and droplet-free deposition.
To facilitate the growth of "buffer-free" deposition of GaSb on GaAs substrate with low TD densities, in complex device structures, it is essential to understand the structural properties of IMF-grown GaSb epitaxial layers.
A potentially attractive processing route is the electroless autocatalytic process, since this has the advantage of permitting non-directional and sulfur-free deposition.
The 3D scaffold structure of NFs endows the graphene-based electrodes with large surface area and short diffusion length of ions, while the binder-free deposition enhances the internal binding between graphene materials and the NF current collectors, and thus results in low contact resistance.
The hot wire chemical vapor deposition (HWCVD) technique is used in this experiment for deposition of the multilayer structure, as it provides better gas utilization, defect-free deposition from ion bombardment and moderate deposition rate in comparison with the plasma-enhanced CVD technique.
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