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Both chips are scheduled for fabrication using TSMC's 40nm-G process.
A visible wavelength linear photosensor featuring a pixel size of 3 μm has been designed for fabrication using commercial 0.25 μm CMOS technology.
Nonetheless, the micro size of these parts impose challenges for fabrication using high production processes, like polymer injection moulding submitted to high cooling rates and variability of the process, in addition to the complex design of precise mould micro-cavities.
One of the innovative modelling methods is to directly slice the point cloud along a direction and generate a layer-based model, which can be used directly for fabrication using rapid prototyping (RP) techniques.
PCL also has a slower degradation rate than other polymers [ 38, 39], exists in an elastic state at room temperature, and has a low melting point of 60°, making it a good candidate for fabrication using fused deposition modeling [ 83].
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An understanding of the droplet formation and jet breakup behavior of DCM CO2 in this regime is useful in experimental design for particle fabrication using SAS method.
The dye-impregnated TiO2 and ZnO photoanodes have been used for DSSCs fabrication, using the same customized microfluidic architecture.
Controlling the interactions among particles and particle kinetics is required for device fabrication using the self-assembly method [21 23].
This happened, for example, in fabrication using electron-beam lithography followed by oxygen plasma etching, which yields GNRs with rough edges.
The chosen processing steps allow for wafer-level device fabrication using standard MEMS processing tools.
Simple synthesis procedures and easy accessibility to cylindrical nanostructures in a range of compositions (∼25 35%) through controlled polymerizations allow a versatile choice of materials for nanoparticle fabrications using this technique.
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