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Circular graphite substrates have been nitrided in a plasma focus device.
Thin films of titanium carbide (TiC) were deposited on 304-stainless steel substrates using a dense plasma focus device.
These results confirm the first ever deposition of TiC thin films using a dense plasma focus device.
Numerical experiments have been conducted on UNU/ICTP PF plasma focus device with Xe filling gas using Lee model.
A 3.3 kJ pulsed plasma focus device was used to deposit thin films of titanium nitride (TiN) at room temperature onto the stainless steel AISI 304 substrates.
Polycrystalline, smooth and hard thin films of TiN are successfully deposited at room temperature stainless steel AISI 304 substrates using the plasma focus device.
Similar(20)
Plasma focus devices were studied in order to identify the design parameters and logical relationships that exist among device components.
"There are many important applications awaiting a successful sub-wavelength acoustical focusing device," says Pendry.
Garstecki, P. et al. Formation of monodisperse bubbles in a microfluidic flow-focusing device.
Xu, Q. et al. Preparation of monodisperse biodegradable polymer microparticles using a microfluidic flow-focusing device for controlled drug delivery.
Steady sextupole magnet has a function as neutron beam focusing device with chromatic aberration.
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