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Goldstein and Goodwin [159] evaluated plastic ingestion by gooseneck barnacles (Lepas anatifera, Lepas pacifica, Lepas sp ., rafting organisms attached to floating substrates at the sea surface.
High-power impulse magnetron sputtering (HiPIMS) with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric HfO2 films onto floating substrates.
Reactive mid-frequency ac magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate depositions of defect-free, hard and highly optically transparent stoichiometric ZrO2 films onto floating substrates.
The coatings deposited on floating substrates exhibit hardness values in the range of 20 GPa to 30 GPa, which can be extended to 40 GPa by application of a substrate bias voltage of –60 V.
In the present work, amorphous Si B C N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single (B4C 25Si75 target in a 50% Ar + 50% N2 gas mixture.
High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified stoichiometric ZrO2 and Ta2O5 films onto floating substrates.
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Cubic CrN coatings were deposited using these three techniques with a floating substrate bias.
ZrO2-Al2O3 coatings were deposited on a floating substrate at a temperature of 370 °C.
This is most relevant in the open ocean, where only very limited floating substrate is available [128, 192].
Values for the thermal substrate load, ion current density onto a floating substrate, and self-bias voltage are compared for DC and pulsed powering.
However, the tantalum coatings produced under similar conditions with an unbiased (floating) substrate were found to be the beta phase of the material and had a columnar microstructure.
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