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Table 1 Sputtering conditions of ZnS films Parameter Condition Target ZnS (99.99% pure) Substrate Corning E2000 glass RF power 120 W Sputtering gas Pure argon (55 sccm) Deposition time 20 min Sputtering pressure 3 × 10-2 Torr Substrate temperature 100°C, 200°C, 250°C, 300°C, 350°C, 400°C Target to substrate distance 50 mm.
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In order to evaluate the mechanical properties experienced by a thin film parameter on the rigid substrate, the author proposes a semi-analytical model to estimate the deformation of the thin film under various conditions.
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