Sentence examples for film surface structure from inspiring English sources
Atomic force microscopy and scanning electron microscopy images of the samples provide useful information on the film surface structure.
Results showed that the order of the thin-film surface structure was perfected, the defect density and resistivity were both firstly reduced and then increased when the hydrogen-ion energy was increased from 0 eV to 500 eV.
Cross-sectional transmission electron microscopy (TEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and scanning electron microscope (SEM) were employed to characterize the films' surface structure and morphology.
The characteristics of the silver-plated film surface and structure, e.g., surface roughness, film thickness and grain structure impacted the bonding quality which was verified by the full factorial design of experiment (DOE) wedge pull test.
Niwa and co-workers investigated the effects of a bare ITO film electrode surface structure on human cytochrome (CYP3A4) by using polycrystalline ITO and amorphous ITO film.
However, the relationship between spin casting parameters and film surface molecular structure is poorly understood.
With the larger distance from thin film surface, the structure gradually changed from "Edge-on" to "Face-on".
The interfacial characteristics was investigated by indentation tests and the thin film surface morphology, phase structure and residual stress analyzed by scanning electron microscopy (SEM), X ray diffraction (XRD) and Raman spectroscopy.
The final part of the chapter describes the nanoperspectives of FG thin films and surface structures with nanoelectromechanical system (NEMS) properties and which were produced using the previously described deposition methods.
From the average thickness of the TI film and the observed surface structure, we conclude that the TI film consists of 9 QL (the ninth layer is ∼97% closed), with additional material distributed in form of islands in three open layers on top of the ninth QL.
Reactions at both the electrode surface and at the film surface within the pore structure are considered.
